| 1 |
Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers
Phae-ngam W, Horprathum M, Chananonnawathorn C, Lertvanithphol T, Samransuksamer B, Songsiriritthigul P, Nakajima H, Chaiyakun S
Current Applied Physics, 19(8), 894, 2019 |
| 2 |
The effect of titanium current on structure and hardness of aluminium titanium nitride deposited by reactive unbalanced magnetron co-sputtering
Buranawong A, Witit-anun N, Chaiyakun S, Pokaipisit A, Limsuwan P
Thin Solid Films, 519(15), 4963, 2011 |
| 3 |
Low-temperature deposition of (110) and (101) rutile TiO2 thin films using dual cathode DC unbalanced magnetron sputtering for inducing hydroxyapatite (vol 117, pg 288, 2009)
Kasemanankul P, Witit-Anan N, Chaiyakun S, Limsuwan P, Boonamnuayvitaya V
Materials Chemistry and Physics, 120(1), 229, 2010 |
| 4 |
Low-temperature deposition of (110) and (101) rutile TiO2 thin films using dual cathode DC unbalanced magnetron sputtering for inducing hydroxyapatite
Kasemanankul P, Witit-Anan N, Chaiyakun S, Limsuwan P, Boonamnuayvitaya V
Materials Chemistry and Physics, 117(1), 288, 2009 |
