화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Recent advances in resists for 157 nm microlithography
Trinque BC, Chiba T, Hung RJ, Chambers CR, Pinnow MJ, Osburn BP, Tran HV, Wunderlich J, Hsieh YT, Thomas BH, Shafer G, DesMarteau DD, Conley W, Willson CG
Journal of Vacuum Science & Technology B, 20(2), 531, 2002
2 Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results
Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh YT, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, MacDonald SA, Willson CG, Sanders DP, Connor EF, Grubbs RH, Conley W
Macromolecules, 35(17), 6539, 2002