검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing Sha J, Jung B, Thompson MO, Ober CK, Chandhok M, Younkin TR Journal of Vacuum Science & Technology B, 27(6), 3020, 2009 |
| 2 |
Improvement in linewidth roughness by postprocessing Chandhok M, Frasure K, Putna ES, Younkin TR, Rachmady W, Shah U, Yueh W Journal of Vacuum Science & Technology B, 26(6), 2265, 2008 |
| 3 |
Long-term stability of Ru-based protection layers in extreme ultraviolet lithography: A surface science approach Over H, He YB, Farkas A, Mellau G, Korte C, Knapp M, Chandhok M, Fang M Journal of Vacuum Science & Technology B, 25(4), 1123, 2007 |
| 4 |
Lithographic flare measurements if Intel's microexposure tool optics Chandhok M, Lee SH, Roberts J, Rice BJ, Cao HB Journal of Vacuum Science & Technology B, 24(1), 274, 2006 |
| 5 |
Absorbance measurement of polymers at extreme ultraviolet wavelength: Correlation between experimental and theoretical calculations Kwark YJ, Bravo-Vasquez JP, Chandhok M, Cao HD, Deng H, Gullikson E, Ober CK Journal of Vacuum Science & Technology B, 24(4), 1822, 2006 |
| 6 |
Effects of flare in extreme ultraviolet lithography: Learning from the engineering test stand Chandhok M, Lee SH, Bacuita T Journal of Vacuum Science & Technology B, 22(6), 2966, 2004 |