검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Yield improvement of 0.13 mu m Cu/low-k dual-damascene interconnection by organic cleaning process Kim NH, Kim SY, Lee HK, Lee KY, Kim CI, Chang EG Journal of Vacuum Science & Technology B, 25(6), 1819, 2007 |
| 2 |
Chemical mechanical planarization characteristics of WO3 thin film for gas sensing Seo YJ, Kim NH, Chang EG, Park J, Ko PJ, Lee WS Journal of Vacuum Science & Technology A, 23(4), 737, 2005 |
| 3 |
Removal characteristics of hillock on SnO2 thin film by chemical mechanical polishing process Seo YJ, Kim NH, Chang EG, Park J, Choi GW, Lee WS Journal of Vacuum Science & Technology A, 23(4), 1133, 2005 |
| 4 |
Electrochemical patterning of copper using microcontact printing Lim JH, Kim NH, Chang EG Journal of the Electrochemical Society, 151(7), C455, 2004 |
| 5 |
Damage in etching of (Ba,Sr)TiO3 thin films using inductively coupled plasma Choi SK, Kim DP, Kim CI, Chang EG Journal of Vacuum Science & Technology A, 19(4), 1063, 2001 |
| 6 |
Etching characteristics of SrBi(2)Ya(2)O(9) film with Ar/CHF3 plasma Seo JW, Lee DH, Lee WJ, Yu BG, Kwon KH, Yeom GY, Chang EG, Kim CI Journal of Vacuum Science & Technology A, 18(4), 1354, 2000 |
| 7 |
Effects of BCl3 addition on Ar/Cl-2 gas in inductively coupled plasmas for lead zirconate titanate etching An TH, Park JY, Yeom GY, Chang EG, Kim CI Journal of Vacuum Science & Technology A, 18(4), 1373, 2000 |
| 8 |
Roles of N-2 gas in etching of platinum by inductively coupled Ar/Cl-2/N-2 plasmas Ryu JH, Kim NH, Kim HS, Yeom GY, Chang EG, Kim CI Journal of Vacuum Science & Technology A, 18(4), 1377, 2000 |
| 9 |
Effects of BCl3 addition on Ar/Cl-2 gas in inductively coupled plasmas for lead zirconate titanate etching (vol 18, pg 1373, 2000) An TH, Park JY, Yeom GY, Chang EG, Kim CI Journal of Vacuum Science & Technology A, 18(6), 3012, 2000 |
| 10 |
Study on surface reaction of (Ba,Sr)TiO3 thin films by high density plasma etching Kim SB, Kim CI, Chang EG, Yeom GY Journal of Vacuum Science & Technology A, 17(4), 2156, 1999 |