화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Comparison of Different Analytical Techniques in Measuring the Surface Region of Ultrashallow Doping Profiles
Felch SB, Chapek DL, Malik SM, Maillot P, Ishida E, Magee CW
Journal of Vacuum Science & Technology B, 14(1), 336, 1996
2 Structural Characterization of Plasma-Doped Silicon by High-Resolution X-Ray-Diffraction
Chapek DL, Conrad JR, Matyi RJ, Felch SB
Journal of Vacuum Science & Technology B, 12(2), 951, 1994