화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Egorov KV, Lebedinskii YY, Soloviev AA, Chouprik AA, Azarov AY, Markeev AM
Applied Surface Science, 419, 107, 2017
2 Resistive switching effect in HfxAl1-xOy with a graded Al depth profile studied by hard X-ray photoelectron spectroscopy
Matveyev YA, Markeev AM, Lebedinskii YY, Chouprik AA, Egorov KV, Drube W, Zenkevich AV
Thin Solid Films, 563, 20, 2014
3 Electrical properties of quaternary HfAlTiO thin films grown by atomic layer deposition
Alekhin AP, Chouprik AA, Grigal IP, Gudkova SA, Lebedinskii YY, Markeev AM, Zaitsev SA
Thin Solid Films, 520(14), 4547, 2012