화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Electroless Cu deposition on atomic layer deposited Ru as novel seed formation process in through-Si vias
Inoue F, Philipsen H, Radisic A, Armini S, Civale Y, Leunissen P, Kondo M, Webb E, Shingubara S
Electrochimica Acta, 100, 203, 2013
2 Electroless Copper Bath Stability Monitoring with UV-VIS Spectroscopy, pH, and Mixed Potential Measurements
Inoue F, Philipsen H, Radisic A, Armini S, Civale Y, Shingubara S, Leunissen P
Journal of the Electrochemical Society, 159(7), D437, 2012
3 Void-Free Filling of HAR TSVs Using a Wet Alkaline Cu Seed on CVD Co as a Replacement for PVD Cu Seed
Armini S, El-Mekki Z, Vandersmissen K, Philipsen H, Rodet S, Honore M, Radisic A, Civale Y, Beyne E, Leunissen L
Journal of the Electrochemical Society, 158(2), H160, 2011
4 Ultra-high aspect-ratio FinFET technology
Jovanovic V, Suligoj T, Poljak M, Civale Y, Nanver LK
Solid-State Electronics, 54(9), 870, 2010
5 Accurate SIMS doping profiling of aluminum-doped solid-phase epitaxy silicon islands
Civale Y, Nanver LK, Alberici SG, Gammon A, Kelly I
Electrochemical and Solid State Letters, 11(4), H74, 2008