검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
High Density Plasma Etching of Nickel Thin Films Using a Cl2/Ar Plasma Cho HN, Min SR, Bae HJ, Lee JH, Chung CW Journal of Industrial and Engineering Chemistry, 13(6), 939, 2007 |
| 2 |
Cl2/Ar 플라즈마를 이용한 ZnO 박막의 식각 특성 민수련, 이장우, 조한나, 정지원 Journal of the Korean Industrial and Engineering Chemistry, 18(1), 24, 2007 |
| 3 |
Ion-Assisted Etching of Si with Cl2 - The Effect of Flux Ratio Coburn JW Journal of Vacuum Science & Technology B, 12(3), 1384, 1994 |