검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Model for a multiple-step deep Si etch process Rauf S, Dauksher WJ, Clemens SB, Smith KH Journal of Vacuum Science & Technology A, 20(4), 1177, 2002 |
| 2 |
Thermal modeling of extreme ultraviolet and step and flash imprint lithography substrates during dry etch Weisbrod EJ, Dauksher WJ, Zhang D, Rauf S, Mangat PJS, Ventzek PLG, Smith KH, Clemens SB, Martin CJ, Engelstad RL Journal of Vacuum Science & Technology B, 20(6), 3047, 2002 |
| 3 |
Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication Dauksher WJ, Clemens SB, Resnick DJ, Smith KH, Mangat PJS, Rauf S, Ventzek PLG, Ashraf H, Lea L, Hall S, Johnston IR, Hopkins J, Chambers A, Bhardwaj JK Journal of Vacuum Science & Technology B, 19(6), 2921, 2001 |
| 4 |
TaSiN thin-film pattern transfer optimization for 200 mm SCALPEL and extreme ultraviolet lithography masks Dauksher WJ, Resnick DJ, Clemens SB, Standfast DL, Masnyj ZS, Wasson JR, Bergmann NM, Han SI, Mangat PJS Journal of Vacuum Science & Technology B, 18(6), 3232, 2000 |