검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Deposition of nanocryctalline silicon thin films: Effect of total pressure and substrate temperature Baghdad R, Benlakehal D, Portier X, Zellama K, Charvet S, Sib JD, Clin M, Chahed L Thin Solid Films, 516(12), 3965, 2008 |
| 2 |
Spectroscopic study using FTIR, Raman, XPS and NEXAFS of carbon nitride thin films deposited by RF magnetron sputtering Bouchet-Fabre B, Marino E, Lazar G, Zellama K, Clin M, Ballutaud D, Abel F, Godet C Thin Solid Films, 482(1-2), 167, 2005 |
| 3 |
Deposition mechanism of sputtered amorphous carbon nitride thin film Durand-Drouhin O, Benlahsen M, Clin M, Bouzerar R Applied Surface Science, 223(4), 269, 2004 |
| 4 |
Nanocrystalline silicon thin films prepared by radiofrequency magnetron sputtering Goncalves C, Charvet S, Zeinert A, Clin M, Zellama K Thin Solid Films, 403-404, 91, 2002 |
| 5 |
Effect of annealing on the structural and electrical properties of d.c. multipolar plasma deposited a-C : H films Clin M, Benlahsen M, Zeinert A, Zellama K, Naud C Thin Solid Films, 372(1-2), 60, 2000 |