검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Modeling the impact of photoresist trim etch process on photoresist surface roughness Rauf S, Stout PJ, Cobb J Journal of Vacuum Science & Technology B, 21(2), 655, 2003 |
| 2 |
Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography Cardinale GF, Henderson CC, Goldsmith JEM, Mangat PJS, Cobb J, Hector SD Journal of Vacuum Science & Technology B, 17(6), 2970, 1999 |
| 3 |
Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber Mangat PJS, Hector SD, Thompson MA, Dauksher WJ, Cobb J, Cummings KD, Mancini DP, Resnick DJ, Cardinale G, Henderson C, Kearney P, Wedowski M Journal of Vacuum Science & Technology B, 17(6), 3029, 1999 |
| 4 |
Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation Brainard RL, Henderson C, Cobb J, Rao V, Mackevich JF, Okoroanyanwu U, Gunn S, Chambers J, Connolly S Journal of Vacuum Science & Technology B, 17(6), 3384, 1999 |