검색결과 : 19건
| No. | Article |
|---|---|
| 1 |
Etching of ruthenium coatings in O-2- and Cl-2-containing plasmas Hsu CC, Coburn JW, Graves DB Journal of Vacuum Science & Technology A, 24(1), 1, 2006 |
| 2 |
Vacuum beam studies of fluorocarbon radicals and argon ions on Si and SiO2 surfaces Kimura Y, Coburn JW, Graves DB Journal of Vacuum Science & Technology A, 22(6), 2508, 2004 |
| 3 |
Fundamental beam studies of radical enhanced atomic layer deposition of TiN Greer F, Fraser D, Coburn JW, Graves DB Journal of Vacuum Science & Technology A, 21(1), 96, 2003 |
| 4 |
C4F8 dissociation in an inductively coupled plasma Radtke MT, Coburn JW, Graves DB Journal of Vacuum Science & Technology A, 21(4), 1038, 2003 |
| 5 |
Plasma-surface interactions Chang JP, Coburn JW Journal of Vacuum Science & Technology A, 21(5S), S145, 2003 |
| 6 |
Fundamental beam studies of deuterium and fluorine radical reaction kinetics on surfaces Greer F, Fraser D, Coburn JW, Graves DB Journal of Vacuum Science & Technology B, 21(4), 1391, 2003 |
| 7 |
Deuterium and fluorine radical reaction kinetics on photoresist Greer F, Coburn JW, Graves DB Journal of Vacuum Science & Technology B, 20(1), 145, 2002 |
| 8 |
Argon and oxygen ion chemistry effects in photoresist etching Greer F, Van L, Fraser D, Coburn JW, Graves DB Journal of Vacuum Science & Technology B, 20(5), 1901, 2002 |
| 9 |
Measurements of neutral and ion composition, neutral temperature, and electron energy distribution function in a CF4 inductively coupled plasma Singh H, Coburn JW, Graves DB Journal of Vacuum Science & Technology A, 19(3), 718, 2001 |
| 10 |
Appearance potential mass spectrometry: Discrimination of dissociative ionization products Singh H, Coburn JW, Graves DB Journal of Vacuum Science & Technology A, 18(2), 299, 2000 |