화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Effect of Free Radical Activation for Low Temperature Si to Si Wafer Bonding
Byun KY, Ferain I, Colinge C
Journal of the Electrochemical Society, 157(1), H109, 2010
2 Room temperature wafer bonding using oxygen plasma treatment in reactive ion etchers with and without inductively coupled plasma
Sanz-Velasco A, Amirfeiz P, Bengtsson S, Colinge C
Journal of the Electrochemical Society, 150(2), G155, 2003