화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy
Backer SA, Suez I, Fresco ZM, Frechet JMJ, Conway JA, Vedantam S, Lee H, Yablonovitch E
Journal of Vacuum Science & Technology B, 25(4), 1336, 2007
2 The 4p pi(3)Pi(g)-a(3)Sigma(+)(u) system in Ne-20(2) and Ne-22(2)
Conway JA, Shen F, Herring CM, Eden JG, Ginter ML
Journal of Chemical Physics, 115(11), 5126, 2001