| 1 |
LP-CVD silicon-based film formation in submicrometer trenches in industrial equipment: Experiments and simulation
Gris H, Caussat B, Cot D, Durand J, Couderc JP
Advanced Materials, 14(17), A213, 2002 |
| 2 |
Low-pressure chemical vapor deposition of semi-insulating polycrystalline silicon thin films I. Experimental study and proposal of new kinetic laws
Barathieu P, Caussat B, Scheid E, Jaume D, Couderc JP
Journal of the Electrochemical Society, 148(3), C149, 2001 |
| 3 |
Low-pressure chemical vapor deposition of semi-insulating polycrystalline silicon thin films II. Theoretical local analysis of the process
Barathieu P, Caussat B, Scheid E, Couderc JP
Journal of the Electrochemical Society, 148(3), C156, 2001 |
| 4 |
A new technology for chemical vapor deposition reactors. Part One: Presentation and analysis of experimental results
Vergnes H, Duverneuil P, Couderc JP
Canadian Journal of Chemical Engineering, 78(4), 793, 2000 |
| 5 |
new equipment technology for chemical vapor deposition - .2. Modelling of pure silicon desposition from silane and insitu phosphorus doped silicon
Vergnes H, Duverneuil P, Couderc JP
Canadian Journal of Chemical Engineering, 78(4), 803, 2000 |
| 6 |
Influence of principle operating parameters on chemical vapor deposition of silicon from silane in a fluidized bed to limit agglomeration problems
Ruvalcaba JRR, Caussat B, Hemati M, Couderc JP
Canadian Journal of Chemical Engineering, 78(5), 955, 2000 |
| 7 |
Hydrodynamic study of vacuum fluidized beds at high temperature
Ruvalcaba JRR, Caussat B, Hemati M, Couderc JP
Canadian Journal of Chemical Engineering, 77(1), 35, 1999 |
| 8 |
Application of neural networks to the modeling of LPCVD reactors - Deposition of in-situ boron-doped silicon
Fakhr-Eddine K, Cabassud M, Lann MV, Couderc JP
Chemical Engineering Journal, 72(2), 171, 1999 |
| 9 |
Extension of the fluidized bed silicon CVD process to non-conventional operating conditions - Depositions on porous powders and or under reduced pressure
Ruvalcaba JRR, Caussat B, Hemati M, Couderc JP
Chemical Engineering Journal, 73(1), 61, 1999 |
| 10 |
Analysis and modeling of low pressure CVD of silicon nitride from a silane-ammonia mixture - I. Experimental study and determination of a gaseous phase mechanism
Yacoubi K, Azzaro-Pantel C, Scheid E, Couderc JP
Journal of the Electrochemical Society, 146(8), 3009, 1999 |
