검색결과 : 18건
No. | Article |
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1 |
Manufacturing and properties of biomimetic graphite nanoplatelets foils Ricciardi MR, Cristiano F, Bertocchi F, Martone A, Giordano M Polymer Engineering and Science, 59(12), 2443, 2019 |
2 |
Kit(cre) knock-in mice fail to fate-map cardiac stem cells Vicinanza C, Aquila I, Cianflone E, Scalise M, Marino F, Mancuso T, Fumagalli F, Giovannone ED, Cristiano F, Iaccino E, Marotta P, Torella A, Latini R, Agosti V, Veltri P, Urbanek K, Isidori AM, Saur D, Indolfi C, Nadal-Ginard B, Torella D Nature, 555(7697), E1, 2018 |
3 |
Study of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition from tri-methyl-aluminium and dioxygen precursors: Investigation of interfacial and structural properties Lale A, Scheid E, Cristiano F, Datas L, Reig B, Launay J, Temple-Boyer P Thin Solid Films, 666, 20, 2018 |
4 |
Modeling boron dose loss in sidewall spacer stacks of complementary metal oxide semiconductor transistors Essa Z, Pelletier B, Morin P, Boulenc P, Pakfar A, Tavernier C, Wacquant F, Zechner C, Juhel M, Autran JL, Cristiano F Solid-State Electronics, 126, 163, 2016 |
5 |
Extended defects and precipitation in heavily B-doped silicon Cojocaru-Miredin O, Cristiano F, Fazzini PF, Mangelinck D, Blavette D Thin Solid Films, 534, 62, 2013 |
6 |
Effect of Germanium content and strain on the formation of extended defects in ion implanted Silicon/Germanium Fazzini PF, Cristiano F, Talbot E, Ben Assayag G, Paul S, Lerch W, Pakfar A, Hartmann JM Thin Solid Films, 518(9), 2338, 2010 |
7 |
Atomic scale study of a MOS structure with an ultra-low energy boron-implanted silicon substrate Duguay S, Ngamo M, Fazzini PF, Cristiano F, Daoud K, Pareige P Thin Solid Films, 518(9), 2398, 2010 |
8 |
Transfer of physically-based models from process to device simulations: Application to advanced SOI MOSFETs Bazizi EM, Pakfar A, Fazzini PF, Cristiano F, Tavernier C, Claverie A, Zographos N, Zechner C, Scheid E Thin Solid Films, 518(9), 2427, 2010 |
9 |
Overlayer stress effects on defect formation in Si and Ge Cowern NEB, Bennett NS, Ahn C, Yoon JC, Hamm S, Lerch W, Kheyrandish H, Cristiano F, Pakfar A Thin Solid Films, 518(9), 2442, 2010 |
10 |
Laser activation of Ultra Shallow Junctions (USJ) doped by Plasma Immersion Ion Implantation (PIII) Vervisch V, Larmande Y, Delaporte P, Sarnet T, Sentis M, Etienne H, Torregrosa F, Cristiano F, Fazzini PF Applied Surface Science, 255(10), 5647, 2009 |