화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Quantitative depth profiling of SiOxNy layers on Si
van Berkum JGM, Hopstaken MJP, Snijders JHM, Tamminga Y, Cubaynes FN
Applied Surface Science, 203, 414, 2003
2 Examination of the Si(111)-SiO2, Si(110)-SiO2, and Si(100)-SiO2 interfacial properties following rapid thermal annealing
Hurley PK, O'Sullivan BJ, Cubaynes FN, Stolk PA, Widdershoven FP, Das JH
Journal of the Electrochemical Society, 149(3), G194, 2002