검색결과 : 2건
No. | Article |
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1 |
Quantitative depth profiling of SiOxNy layers on Si van Berkum JGM, Hopstaken MJP, Snijders JHM, Tamminga Y, Cubaynes FN Applied Surface Science, 203, 414, 2003 |
2 |
Examination of the Si(111)-SiO2, Si(110)-SiO2, and Si(100)-SiO2 interfacial properties following rapid thermal annealing Hurley PK, O'Sullivan BJ, Cubaynes FN, Stolk PA, Widdershoven FP, Das JH Journal of the Electrochemical Society, 149(3), G194, 2002 |