화학공학소재연구정보센터
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No. Article
1 Photoreflectance characterization of ultrashallow junction activation in millisecond annealing
Chism W, Current M, Vartanian V
Journal of Vacuum Science & Technology B, 28(1), C1C15, 2010
2 Insights in junction photovoltage based sheet resistance measurements for advanced complementary metal-oxide semiconductor
Clarysse T, Moussa A, Zangerle T, Schaus F, Vandervorst W, Faifer V, Current M
Journal of Vacuum Science & Technology B, 26(1), 420, 2008
3 Papers from the Fourth International Workshop on the Measurement and Characterization of Ultra-shallow Doping Profiles in Semiconductors - 6-9 April 1997 MCNC, Center for Microelectronics Research Triangle Park, North Carolina - Preface
Current M, Kump M, McGuire G
Journal of Vacuum Science & Technology B, 16(1), 259, 1998