검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
157 nm: Deepest deep-ultraviolet yet Rothschild M, Bloomstein TM, Curtin JE, Downs DK, Fedynyshyn TH, Hardy DE, Kunz RR, Liberman V, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C Journal of Vacuum Science & Technology B, 17(6), 3262, 1999 |
| 2 |
Outlook for 157 nm resist design Kunz RR, Bloomstein TM, Hardy DE, Goodman RB, Downs DK, Curtin JE Journal of Vacuum Science & Technology B, 17(6), 3267, 1999 |
| 3 |
Nanochannel fabrication for chemical sensors Stern MB, Geis MW, Curtin JE Journal of Vacuum Science & Technology B, 15(6), 2887, 1997 |
| 4 |
Profile Control in Dry Development of High-Aspect-Ratio Resist Structures Stern MB, Palmateer SC, Horn MW, Rothschild M, Maxwell BE, Curtin JE Journal of Vacuum Science & Technology B, 13(6), 3017, 1995 |