화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Reactive ion etching of Si by Cl and Cl-2 ions: Molecular dynamics simulations with comparisons to experiment
Hanson DE, Kress JD, Voter AF
Journal of Vacuum Science & Technology A, 17(4), 1510, 1999
2 Molecular dynamics simulations of Cl-2(+) impacts onto a chlorinated silicon surface: Energies and angles of the reflected Cl-2 and Cl fragments
Helmer BA, Graves DB
Journal of Vacuum Science & Technology A, 17(5), 2759, 1999
3 Molecular dynamics simulations of Ar+ and Cl+ impacts onto silicon surfaces : Distributions of reflected energies and angles
Helmer BA, Graves DB
Journal of Vacuum Science & Technology A, 16(6), 3502, 1998
4 Molecular-Dynamics Simulations of Fluorosilyl Species Impacting Fluorinated Silicon Surfaces with Energies from 0.1 to 100 eV
Helmer BA, Graves DB
Journal of Vacuum Science & Technology A, 15(4), 2252, 1997