검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl-2/O-2 plasma etching of Si Ullal SJ, Singh H, Daugherty J, Vahedi V, Aydil ES Journal of Vacuum Science & Technology A, 20(4), 1195, 2002 |
| 2 |
Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks Ullal SJ, Singh H, Daugherty J, Vahedi V, Aydil ES Journal of Vacuum Science & Technology B, 20(5), 1939, 2002 |