검색결과 : 2건
No. | Article |
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1 |
Design and integration considerations for end-of-the roadmap ultrashallow junctions Osburn CM, De I, Yee KF, Srivastava A Journal of Vacuum Science & Technology B, 18(1), 338, 2000 |
2 |
Impact of gate workfunction on device performance at the 50 nm technology node De I, Johri D, Srivastava A, Osburn CM Solid-State Electronics, 44(6), 1077, 2000 |