검색결과 : 2건
No. | Article |
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1 |
Comparison of electromigration in cu interconnects with atomic-layer-or physical-vapor-deposited TaN liners Hu CK, Gignac L, Liniger E, Grunow S, Demarest JJ, Redder B, Simon A, Liew SL Journal of the Electrochemical Society, 154(9), H755, 2007 |
2 |
Nanometer-scale arrangement of human serum albumin by adsorption on defect arrays created with a finely focused ion beam Bergman AA, Buijs J, Herbig J, Mathes DT, Demarest JJ, Wilson CD, Reimann CT, Baragiola RA, Hu R, Oscarsson SO Langmuir, 14(24), 6785, 1998 |