화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Comparison of electromigration in cu interconnects with atomic-layer-or physical-vapor-deposited TaN liners
Hu CK, Gignac L, Liniger E, Grunow S, Demarest JJ, Redder B, Simon A, Liew SL
Journal of the Electrochemical Society, 154(9), H755, 2007
2 Nanometer-scale arrangement of human serum albumin by adsorption on defect arrays created with a finely focused ion beam
Bergman AA, Buijs J, Herbig J, Mathes DT, Demarest JJ, Wilson CD, Reimann CT, Baragiola RA, Hu R, Oscarsson SO
Langmuir, 14(24), 6785, 1998