검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool Naulleau PP, Anderson CN, Chiu J, Dean K, Denham P, George S, Goldberg KA, Hoef B, Jones G, Koh C, La Fontaine B, Ma A, Montgomery W, Niakoula D, Park JO, Wallow T, Wurm S Journal of Vacuum Science & Technology B, 27(1), 66, 2009 |
| 2 |
Pushing extreme ultraviolet lithography development beyond 22 nm half pitch Naulleau PP, Anderson CN, Baclea-an LM, Denham P, George S, Goldberg KA, Goldstein M, Hoef B, Jones G, Koh C, La Fontaine B, Montgomery W, Wallow T Journal of Vacuum Science & Technology B, 27(6), 2911, 2009 |
| 3 |
Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool Naulleau PP, Anderson CN, Dean K, Denham P, Goldberg KA, Hoef B, Niakoula D, La Fontaine B, Wallow T Journal of Vacuum Science & Technology B, 25(6), 2132, 2007 |
| 4 |
Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool Anderson CN, Naulleau PP, Denham P, Kemp D, Rekawa S Journal of Vacuum Science & Technology B, 25(6), 2151, 2007 |
| 5 |
Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source Naulleau P, Cain JP, Anderson E, Dean K, Denham P, Goldberg KA, Hoef B, Jackson K Journal of Vacuum Science & Technology B, 23(6), 2840, 2005 |
| 6 |
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic Naulleau PP, Goldberg KA, Anderson E, Cain JP, Denham P, Jackson K, Morlens AS, Rekawa S, Salmassi F Journal of Vacuum Science & Technology B, 22(6), 2962, 2004 |
| 7 |
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Naulleau P, Goldberg KA, Anderson EH, Attwood D, Batson P, Bokor J, Denham P, Gullikson E, Harteneck B, Hoef B, Jackson K, Olynick D, Rekawa S, Salmassi F, Blaedel K, Chapman H, Hale L, Mirkarimi P, Soufli R, Spiller E, Sweeney D, Taylor J, Walton C, O'Connell D, Tichenor D, Gwyn CW, Yan PY, Zhang GJ Journal of Vacuum Science & Technology B, 20(6), 2829, 2002 |
| 8 |
Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system Goldberg KA, Naulleau P, Batson P, Denham P, Anderson EH, Chapman H, Bokor J Journal of Vacuum Science & Technology B, 18(6), 2911, 2000 |
| 9 |
At-wavelength detection of extreme ultraviolet lithography mask blank defects Jeong ST, Idir M, Lin Y, Johnson L, Rekawa S, Jones M, Denham P, Batson P, Levesque R, Kearney P, Yan PY, Gullikson E, Underwood JH, Bokor J Journal of Vacuum Science & Technology B, 16(6), 3430, 1998 |