화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Impact of Out-of-Plane Translational Order in Block Copolymer Lithography
Bosworth JK, Dobisz EA, Hellwig O, Ruiz R
Macromolecules, 44(23), 9196, 2011
2 Effects of molecular properties on nanolithography in polymethyl methacrylate
Dobisz EA, Brandow SL, Bass R, Mitterender J
Journal of Vacuum Science & Technology B, 18(1), 107, 2000
3 Nanolithography in polymethylmethacrylate: An atomic force microscope study
Dobisz EA, Brandow SL, Bass R, Shirey LM
Journal of Vacuum Science & Technology B, 16(6), 3695, 1998
4 Electron-beam nanolithography, acid diffusion, and chemical kinetics in SAL-601
Dobisz EA, Fedynyshyn TN, Ma D, Shirey LM, Bass R
Journal of Vacuum Science & Technology B, 16(6), 3773, 1998
5 Atomic force microscope studies of nanolithographic exposure and development of polymethylmethacrylate
Dobisz EA, Brandow SL, Snow E, Bass R
Journal of Vacuum Science & Technology B, 15(6), 2318, 1997
6 Control in sub-100 nm lithography in SAL-601
Dobisz EA, Marrian CRK
Journal of Vacuum Science & Technology B, 15(6), 2327, 1997
7 Modeling of Electron Elastic and Inelastic-Scattering
Marrian CR, Perkins FK, Park D, Dobisz EA, Peckerar MC, Rhee KW, Bass R
Journal of Vacuum Science & Technology B, 14(6), 3864, 1996
8 3-Dimensional Electron-Optical Modeling of Scanning Tunneling Microscope Lithography in Resists
Dobisz EA, Koops HW, Perkins FK, Marrian CR, Brandow SL
Journal of Vacuum Science & Technology B, 14(6), 4148, 1996
9 Spectroscopic Characterization of Self-Assembled Organosilane Monolayer Films
Perkins FK, Dobisz EA, Marrian CR, Brandow SL
Journal of Vacuum Science & Technology B, 13(6), 2841, 1995
10 Effects of Etch Chemistry on SF6-Based Tungsten Etching by Electron-Cyclotron-Resonance Reactive Ion Etching
Eddy CR, Kosakowski J, Shirey LM, Dobisz EA, Rhee KW, Chu W, Foster KW, Marrian CR, Peckerar MC
Journal of Vacuum Science & Technology B, 12(6), 3351, 1994