검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Impact of Reduced Resist Thickness on Deep-Ultraviolet Lithography Azuma T, Ohiwa T, Okumura K, Farrell T, Nunes R, Dobuzinsky D, Fichtl G, Gutmann A Journal of Vacuum Science & Technology B, 14(6), 4246, 1996 |
| 2 |
CVD of Fluorosilicate Glass for ULSI Applications Shapiro MJ, Nguyen SV, Matsuda T, Dobuzinsky D Thin Solid Films, 270(1-2), 503, 1995 |
| 3 |
High Selectivity Magnetically Enhanced Reactive Ion Etching of Boron-Nitride Films Cote D, Nguyen S, Dobuzinsky D, Basa C, Neureither B Journal of the Electrochemical Society, 141(12), 3456, 1994 |