검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Process optimization and integration of trimethylsilane-deposited alpha-SiC : H and alpha-SiCO : H dielectric thin films for damascene processing Gray WD, Loboda MJ, Bremmer JN, Struyf H, Lepage M, Van Hove M, Donaton RA, Sleeckx E, Stucchi M, Lanckmans F, Gao T, Boullart W, Coenegrachts B, Maenhoudt M, Vanhaelemeersch S, Meynen H, Maex K Journal of the Electrochemical Society, 150(7), G404, 2003 |
| 2 |
Nondestructive characterization of thin silicides using x-ray reflectivity Detavernier C, De Gryse R, Van Meirhaeghe RL, Cardon F, Ru GP, Qu XP, Li BZ, Donaton RA, Maex K Journal of Vacuum Science & Technology A, 18(2), 470, 2000 |
| 3 |
Ion-bombardment effects on PtSi/n-Si Schottky contacts studied by ballistic electron emission microscopy Ru GP, Qu XP, Zhu SY, Li BZ, Detavernier C, Van Meirhaeghe RL, Cardon F, Donaton RA, Maex K Journal of Vacuum Science & Technology B, 18(4), 1942, 2000 |
| 4 |
Ion-induced amorphization and regrowth of C49 and C54 TiSi2 Mohadjeri B, Maex K, Donaton RA, Bender H Journal of the Electrochemical Society, 146(3), 1122, 1999 |
| 5 |
Limitation of HF-based chemistry for deep-submicron contact hole cleaning on silicides Baklanov MR, Kondoh E, Donaton RA, Vanhaelemeersch S, Maex K Journal of the Electrochemical Society, 145(9), 3240, 1998 |
| 6 |
Kinetics and Mechanism of the Etching of CoSi2 in HF-Based Solutions Baklanov MR, Badmaeva IA, Donaton RA, Sveshnikova LL, Storm W, Maex K Journal of the Electrochemical Society, 143(10), 3245, 1996 |