1 |
Silane injection in a high-density low-pressure plasma system and its influence on the deposition kinetics and material properties of SiO2 Botha R, Ibrahim BH, Bulkin P, Drevillon B Journal of Vacuum Science & Technology A, 26(5), 1115, 2008 |
2 |
Deposition of dielectrics using a matrix distributed electron cyclotron resonance plasma enhanced chemical vapor deposition system Botha R, Ibrahim BH, Bulkin P, Drevillon B Thin Solid Films, 515(19), 7594, 2007 |
3 |
Recombination traffic in highly crystallized undoped microcrystalline Si films studied by steady state photoconductivity Ram SK, Kumar S, Vanderhaghen R, Drevillon B, Cabarrocas PRI Thin Solid Films, 511, 556, 2006 |
4 |
Simple method of gas flow ratio optimization in high rate deposition of SiO2 by electron cyclotron resonance plasma enhanced chemical vapor deposition Daineka D, Bulkin P, Girard G, Drevillon B Journal of Vacuum Science & Technology A, 22(1), 36, 2004 |
5 |
General methods for optimized design and calibration of Mueller polarimeters De Martino A, Garcia-Caurel E, Laude B, Drevillon B Thin Solid Films, 455-56, 112, 2004 |
6 |
Spectroscopic Mueller polarimeter based on liquid crystal devices Garcia-Caurel E, De Martino A, Drevillon B Thin Solid Films, 455-56, 120, 2004 |
7 |
Application of FTIR ellipsometry to detect and classify microorganisms Garcia-Caurel E, Nguyen J, Schwartz L, Drevillon B Thin Solid Films, 455-56, 722, 2004 |
8 |
An interfacial study of a hydrogenated carbon interlayer for adhesion enhancement of plasma deposited silica thin films on polycarbonate Hofrichter A, Bulkin P, Drevillon B Journal of Adhesion Science and Technology, 16(4), 395, 2002 |
9 |
Plasma treatment of polycarbonate for improved adhesion Hofrichter A, Bulkin P, Drevillon B Journal of Vacuum Science & Technology A, 20(1), 245, 2002 |
10 |
Deposition of silicon alloys in an integrated distributed electron cyclotron resonance reactor: Oxide, nitride, oxinitrides, and multilayer structures Bulkin P, Hofrichter A, Heitz T, Huc J, Drevillon B, Benattar JJ Journal of Vacuum Science & Technology A, 20(2), 338, 2002 |