화학공학소재연구정보센터
검색결과 : 40건
No. Article
1 Silane injection in a high-density low-pressure plasma system and its influence on the deposition kinetics and material properties of SiO2
Botha R, Ibrahim BH, Bulkin P, Drevillon B
Journal of Vacuum Science & Technology A, 26(5), 1115, 2008
2 Deposition of dielectrics using a matrix distributed electron cyclotron resonance plasma enhanced chemical vapor deposition system
Botha R, Ibrahim BH, Bulkin P, Drevillon B
Thin Solid Films, 515(19), 7594, 2007
3 Recombination traffic in highly crystallized undoped microcrystalline Si films studied by steady state photoconductivity
Ram SK, Kumar S, Vanderhaghen R, Drevillon B, Cabarrocas PRI
Thin Solid Films, 511, 556, 2006
4 Simple method of gas flow ratio optimization in high rate deposition of SiO2 by electron cyclotron resonance plasma enhanced chemical vapor deposition
Daineka D, Bulkin P, Girard G, Drevillon B
Journal of Vacuum Science & Technology A, 22(1), 36, 2004
5 General methods for optimized design and calibration of Mueller polarimeters
De Martino A, Garcia-Caurel E, Laude B, Drevillon B
Thin Solid Films, 455-56, 112, 2004
6 Spectroscopic Mueller polarimeter based on liquid crystal devices
Garcia-Caurel E, De Martino A, Drevillon B
Thin Solid Films, 455-56, 120, 2004
7 Application of FTIR ellipsometry to detect and classify microorganisms
Garcia-Caurel E, Nguyen J, Schwartz L, Drevillon B
Thin Solid Films, 455-56, 722, 2004
8 An interfacial study of a hydrogenated carbon interlayer for adhesion enhancement of plasma deposited silica thin films on polycarbonate
Hofrichter A, Bulkin P, Drevillon B
Journal of Adhesion Science and Technology, 16(4), 395, 2002
9 Plasma treatment of polycarbonate for improved adhesion
Hofrichter A, Bulkin P, Drevillon B
Journal of Vacuum Science & Technology A, 20(1), 245, 2002
10 Deposition of silicon alloys in an integrated distributed electron cyclotron resonance reactor: Oxide, nitride, oxinitrides, and multilayer structures
Bulkin P, Hofrichter A, Heitz T, Huc J, Drevillon B, Benattar JJ
Journal of Vacuum Science & Technology A, 20(2), 338, 2002