화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Low temperature growth and physical properties of InAs thin films grown on Si, GaAs and In0.53Ga0.47As template
Alcotte R, Martin M, Moeyaert J, Gergaud P, David S, Cerba T, Bassani F, Ducroquet F, Bogumilowicz Y, Baron T
Thin Solid Films, 645, 119, 2018
2 Dielectric properties, conductivity and Li+ ion motion in LiPON thin films
Le Van-Jodin L, Ducroquet F, Sabary F, Chevalier I
Solid State Ionics, 253, 151, 2013
3 Characteristics of molybdenum bilayer back contacts for Cu(In, Ga)Se-2 solar cells on Ti foils
Roger C, Noel S, Sicardy O, Faucherand P, Grenet L, Karst N, Fournier H, Roux F, Ducroquet F, Brioude A, Perraud S
Thin Solid Films, 548, 608, 2013
4 Magnesium metallic interlayer as an oxygen-diffusion-barrier between high-kappa dielectric thin films and silicon substrate
Rauwel E, Rauwel P, Ducroquet F, Sunding MF, Matko I, Lourenco AC
Thin Solid Films, 520(17), 5602, 2012
5 Addition of yttrium into HfO2 films: Microstructure and electrical properties
Dubourdieu C, Rauwel E, Roussel H, Ducroquet F, Hollander B, Rossell M, Van Tendeloo G, Lhostis S, Rushworth S
Journal of Vacuum Science & Technology A, 27(3), 503, 2009
6 Effect of annealing and electrical properties of high-kappa thin films grown by atomic layer deposition using carboxylic acids as oxygen source
Rauwel E, Ducroquet F, Rauwel P, Willinger MG, Matko I, Pinna N
Journal of Vacuum Science & Technology B, 27(1), 230, 2009
7 Nanoscale leakage current measurements in metal organic chemical vapor deposition crystalline SrTiO3 films
Rozier Y, Gautier B, Hyvert G, Descamps A, Plossu C, Dubourdieu C, Ducroquet F
Thin Solid Films, 517(6), 1868, 2009
8 Structural and electrical characterizations of yttrium oxide films after postannealing treatments (vol 152, 217, 2005)
Durand C, Dubourdieu C, Vallee C, Gautier E, Ducroquet F, Jalabert D, Roussel H, Bonvalot M, Joubert O
Journal of the Electrochemical Society, 153(2), L4, 2006
9 On the mobility in high-kappa/metal gate MOSFETs: Evaluation of the high-kappa phonon scattering impact
Weber O, Casse M, Thevenod L, Ducroquet F, Ernst T, Deleonibus S
Solid-State Electronics, 50(4), 626, 2006
10 Structural and electrical characterizations of yttrium oxide films after postannealing treatments
Durand C, Dubourdieu C, Vallee C, Gautier E, Ducroquet F, Jalabert D, Roussel H, Bonvalot M, Joubert O
Journal of the Electrochemical Society, 152(12), F217, 2005