검색결과 : 40건
No. | Article |
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1 |
Characterization of amorphous carbon films by PECVD and plasma ion implantation: The role of fluorine and sulfur doping Neto AMD, Schreiner WH, Justo JF, de Oliveira AM, Rangel EC, Durrant SF Materials Chemistry and Physics, 227, 170, 2019 |
2 |
Structural and optical properties of a-C: H:O:Cl and a-C:H:Si:O:Cl films obtained by Plasma Enhanced Chemical Vapor Deposition Fernandes IC, Hadich TV, Amorim MKM, Turri RG, Rangel EC, da Silva JHD, Durrant SF Materials Chemistry and Physics, 214, 277, 2018 |
3 |
Growth evolution of self-textured ZnO films deposited by magnetron sputtering at low temperatures Bortoleto JRR, Chaves M, Rosa AM, da Silva EP, Durrant SF, Trino LD, Lisboa PN Applied Surface Science, 334, 210, 2015 |
4 |
Treatment of PVC using an alternative low energy ion bombardment procedure Rangel EC, dos Santos NM, Bortoleto JRR, Durrant SF, Schreiner WH, Honda RY, Rangel RDC, Cruz NC Applied Surface Science, 258(5), 1854, 2011 |
5 |
Structural and optical properties of chlorinated plasma polymers Turri R, Davanzo CU, Schreiner W, da Silva JHD, Appolinario MB, Durrant SF Thin Solid Films, 520(5), 1442, 2011 |
6 |
Developments in hot-filament metal oxide deposition (HFMOD) Durrant SF, Trasferetti BC, Scanninio J, Davanzo CU, Rouxinol FPM, Gelamo RV, de Moraes MAB Thin Solid Films, 516(5), 789, 2008 |
7 |
Characterization of Si : O : C : H films fabricated using electron emission enhanced chemical vapour deposition Durrant SF, Rouxinol FPM, Gelamo RV, Transferetti BC, Davanzo CU, De Moraes MAB Thin Solid Films, 516(5), 803, 2008 |
8 |
Plasma enhanced chemical vapor deposition of titanium(IV) ethoxide-oxygen-helium mixtures Durrant SF, da Cruz NC, Rangel EC, de Moraes MAB Thin Solid Films, 516(15), 4940, 2008 |
9 |
Amorphous carbon nitrogenated films prepared by plasma immersion ion implantation and deposition Rangel EC, Durrant SF, Rangel RCC, Kayama ME, Landers R, da Cruz NC Thin Solid Films, 515(4), 1561, 2006 |
10 |
Tungsten oxide films of high electrochromic efficiencies obtained by deposition Scarminio J, de Moraes MAB, Dias RCE, Rouxinol FP, Durrant SF Electrochemical and Solid State Letters, 6(6), H9, 2003 |