검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Morphology control in thin films of PS: PLA homopolymer blends by dip-coating deposition Vital A, Vayer M, Tillocher T, Dussart R, Boufnichel M, Sinturel C Applied Surface Science, 393, 127, 2017 |
| 2 |
Polymer masks for structured surface and plasma etching Vital A, Vayer M, Sinturel C, Tillocher T, Lefaucheux P, Dussart R Applied Surface Science, 332, 237, 2015 |
| 3 |
Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining Vital A, Vayer M, Sinturel C, Tillocher T, Lefaucheux P, Dussart R, Boufnichel M Polymer, 76, 123, 2015 |
| 4 |
Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O-2 atmosphere Thomann AL, Cormier PA, Dolique V, Semmar N, Dussart R, Lecas T, Courtois B, Brault P Thin Solid Films, 539, 88, 2013 |
| 5 |
IR emission from the target during plasma magnetron sputter deposition Cormier PA, Thomann AL, Dolique V, Balhamri A, Dussart R, Semmar N, Lecas T, Brault P, Snyders R, Konstantinidis S Thin Solid Films, 545, 44, 2013 |
| 6 |
Deep GaN etching by inductively coupled plasma and induced surface defects Ladroue J, Meritan A, Boufnichel M, Lefaucheux P, Ranson P, Dussart R Journal of Vacuum Science & Technology A, 28(5), 1226, 2010 |
| 7 |
Two cryogenic processes involving SF6, O-2, and SiF4 for silicon deep etching Tillocher T, Dussart R, Overzet LJ, Mellhaoui X, Lefaucheux P, Boufnichel M, Ranson P Journal of the Electrochemical Society, 155(3), D187, 2008 |
| 8 |
Oxidation threshold in silicon etching at cryogenic temperatures Tillocher T, Dussart R, Mellhaoui X, Lefaucheux P, Maaza NM, Ranson P, Boufnichel M, Overzet LJ Journal of Vacuum Science & Technology A, 24(4), 1073, 2006 |