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| No. | Article |
|---|---|
| 1 |
Influence on Selective SiO2/Si Etching of Carbon-Atoms Produced by CH4 Addition to a C4F8 Permanent-Magnet Electron-Cyclotron-Resonance Etching Plasma Den S, Kuno T, Ito M, Hori M, Goto T, Okeeffe P, Hayashi Y, Sakamoto Y Journal of Vacuum Science & Technology A, 15(6), 2880, 1997 |