| 1 |
Reaction and thermal stability of cobalt disilicide on polysilicon resulting from a Si/Ti/Co multilayer system
Alberti A, La Via F, Rimini F
Journal of Vacuum Science & Technology B, 17(4), 1448, 1999 |
| 2 |
Formation of Co and Ta silicides on Si(111) and Si(100) substrates from codeposited Co and Ta thin films
Pelleg J
Thin Solid Films, 325(1-2), 60, 1998 |
| 3 |
A Comparative-Study of N(+)/P Junction Formation for Deep-Submicron Elevated Source/Drain Metal-Oxide-Semiconductor Field-Effect Transistors
Sun J, Bartholomew RF, Bellur K, Srivastava A, Osburn CM, Masnari NA, Westhoff R
Journal of the Electrochemical Society, 144(10), 3659, 1997 |
| 4 |
Solid Source Diffusion from Agglomerating Silicide Sources .1. Measurement and Modeling
Tsai JY, Canovai C, Osburn CM, Wang QF, Rose J, Cowen A, Denker MS
Journal of Vacuum Science & Technology B, 12(1), 219, 1994 |
| 5 |
Nondestructive Characterization of the Uniformity of Thin Cobalt Disilicide Films by Raman Microprobe Measurements
Perezrodriguez A, Roca E, Jawhari T, Morante JR, Schreutelkamp RJ
Thin Solid Films, 251(1), 45, 1994 |
