검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Double-layer inorganic antireflective system for KrF lithography Xu M, Ko TM Journal of Vacuum Science & Technology B, 18(1), 127, 2000 |
| 2 |
Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists Kim JB, Yun HJ, Kwon YG, Lee BW Polymer, 41(22), 8035, 2000 |
| 3 |
Sub-100 nm KrF lithography for complementary metal-oxide-semiconductor circuits Fritze M, Astolfi D, Liu H, Chen CK, Suntharalingam V, Preble D, Wyatt PW Journal of Vacuum Science & Technology B, 17(2), 345, 1999 |
| 4 |
Multilayer hexamethyldisiloxane film as bottom antireflective coating for ArF lithography Wang LA, Chen HL Journal of Vacuum Science & Technology B, 17(6), 2772, 1999 |
| 5 |
Reduction of line edge roughness in the top surface imaging process Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 16(6), 3739, 1998 |
| 6 |
Pattern collapse in the top surface imaging process after dry development Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 16(6), 3744, 1998 |
| 7 |
Photosensitization of base-developable poly(phenylhydrosilane) with 3,3 ＇,4,4 ＇-tetra(tert-butylperoxycarbonyl)benzophenone. Mechanism of the drastic photosensitization in terms of photoinduced electron transfer Kani R, Nakano Y, Yoshida H, Hayase S Macromolecules, 31(25), 8794, 1998 |
| 8 |
Poly(Phenylhydrosilane) - Base-Developable Polysilane Resist Kani R, Nakano Y, Yoshida H, Mikoshiba S, Hayase S Journal of Polymer Science Part A: Polymer Chemistry, 35(12), 2355, 1997 |