| 1 |
Monte Carlo raytracing method for calculating secondary electron emission from micro-architected surfaces
Alvarado A, Chang HY, Nadvornick W, Ghoniem N, Marian J
Applied Surface Science, 478, 142, 2019 |
| 2 |
An improved corona discharge ignited by oxide cathodes with high secondary electron emission for toluene degradation
Yao XM, Jiang N, Li J, Lu N, Shang KF, Wu Y
Chemical Engineering Journal, 362, 339, 2019 |
| 3 |
Complex nano-patterning of structural, optical, electrical and electron emission properties of amorphous silicon thin films by scanning probe
Fait J, Cermak J, Stuchlik J, Rezek B
Applied Surface Science, 428, 1159, 2018 |
| 4 |
Calculation of secondary electron emission yields from low-energy electron deposition in tungsten surfaces
Chang HY, Alvarado A, Marian J
Applied Surface Science, 450, 190, 2018 |
| 5 |
Influence of the substrate temperature on the microstructure and electron induced secondary electron emission properties of MgO/Au composite film
Li J, Hue WB, Hao L, Wu SL, Zhang JT
Materials Research Bulletin, 100, 308, 2018 |
| 6 |
Physico-Chemical Processes Induced by Electrical Breakdown and Discharge Responsible for Memory Effect in Krypton with < 10 ppm Nitrogen
Pejovic MM, Pejovic MM, Stankovic K
Plasma Chemistry and Plasma Processing, 38(2), 415, 2018 |
| 7 |
Secondary electron emission properties of Zn-doped MgO thin films grown via electron-beam evaporation
Yu HK
Thin Solid Films, 653, 57, 2018 |
| 8 |
Improvement of electron emission characteristics of porous silicon emitter by using cathode reduction and electrochemical oxidation
He L, Wang WJ, Zhang XN
Applied Surface Science, 399, 592, 2017 |
| 9 |
Discharge and structural characteristics of MgO thin films under various O-2 and H-2 gas flow rates during MgO deposition when using ion plating method in microdischarge cells
Kim DH, Park CS, Jung EY, Kim HJ, Seo H, Hong JG, Shin BJ, Tae HS
Molecular Crystals and Liquid Crystals, 645(1), 123, 2017 |
| 10 |
A Sheath Collision Model with Thermionic Electron Emission and the Schottky Correction Factor for Work Function of Wall Material
Pekker L
Plasma Chemistry and Plasma Processing, 37(3), 825, 2017 |
