검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Electron-beam CARL resist development for 70 nm direct write Kirch O, Elian K, Falk G Journal of Vacuum Science & Technology B, 19(6), 2301, 2001 |
| 2 |
1 kV resist technology for microcolumn-based electron-beam lithography Lee KY, Hsu Y, Le P, Tan ZCH, Chang THP, Elian K Journal of Vacuum Science & Technology B, 18(6), 3408, 2000 |
| 3 |
Comparative evaluation of electron-beam sensitive single layer top surface imaging and bilayer chemical amplification of resist lines process for stencil mask making Elian K, Irmscher M, Butschke J, Letzkus F, Reuter C, Springer R Journal of Vacuum Science & Technology B, 17(6), 3122, 1999 |