검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Recommended practice for process sampling for partial pressure analysis Blessing JE, Ellefson RE, Raby BA, Brucker GA, Waits RK Journal of Vacuum Science & Technology A, 25(1), 167, 2007 |
| 2 |
Spatially resolved mass spectrometric sampling of inductively coupled plasmas using a movable sampling orifice Li X, Oehrlein GS, Schaepkens M, Ellefson RE, Frees LC Journal of Vacuum Science & Technology A, 21(6), 1971, 2003 |
| 3 |
Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmas Kastenmeier BEE, Matsuo PJ, Oehrlein GS, Ellefson RE, Frees LC Journal of Vacuum Science & Technology A, 19(1), 25, 2001 |
| 4 |
Recommended practice for calibrating vacuum gauges of the thermal conductivity type Ellefson RE, Miiller AP Journal of Vacuum Science & Technology A, 18(5), 2568, 2000 |
| 5 |
Mass spectrometric measurements on inductively coupled fluorocarbon plasmas: Positive ions, radicals and endpoint detection Li X, Schaepkens M, Oehrlein GS, Ellefson RE, Frees LC, Mueller N, Korner N Journal of Vacuum Science & Technology A, 17(5), 2438, 1999 |
| 6 |
Miniature quadrupole residual gas analyzer for process monitoring at milliTorr pressures Holkeboer DH, Karandy TL, Currier FC, Frees LC, Ellefson RE Journal of Vacuum Science & Technology A, 16(3), 1157, 1998 |