검색결과 : 21건
| No. | Article |
|---|---|
| 1 |
Experimental determination of image placement accuracy in extreme ultraviolet lithography Raghunathan S, Wood O, Vukkadala P, Engelstad R, Hartley JG Journal of Vacuum Science & Technology B, 27(6), 2905, 2009 |
| 2 |
Control of the receding meniscus in immersion lithography Burnett H, Shedd T, Nellis G, El-Morsi M, Engelstad R, Garoff S, Varanasi K Journal of Vacuum Science & Technology B, 23(6), 2611, 2005 |
| 3 |
Predicting the dynamic response of an extreme ultraviolet reticle during exposure scanning Dicks G, Mikkelson A, Engelstad R, Lovell E Journal of Vacuum Science & Technology B, 23(6), 2856, 2005 |
| 4 |
Effect of electrostatic chucking and substrate thickness uniformity on extreme ultraviolet lithography mask flatness Mikkelson A, Engelstad R, Sohn J, Lovell E Journal of Vacuum Science & Technology B, 22(6), 3043, 2004 |
| 5 |
Predicting the fluid behavior during the dispensing process for step-and-flash imprint lithography Abdo A, Schuetter S, Nellis G, Wei A, Engelstad R, Truskett V Journal of Vacuum Science & Technology B, 22(6), 3279, 2004 |
| 6 |
Predicting air entrainment due to topography during the filling and scanning process for immersion lithography Wei A, El-Morsi M, Nellis G, Abdo A, Engelstad R Journal of Vacuum Science & Technology B, 22(6), 3444, 2004 |
| 7 |
Optimizing the fluid dispensing process for immersion lithography Abdo A, Nellis G, Wei A, El-Morsi M, Engelstad R, Brueck SRJ, Neumann A Journal of Vacuum Science & Technology B, 22(6), 3454, 2004 |
| 8 |
Simulating fluid flow characteristics during the scanning process for immersion lithography Wei A, Abdo A, Nellis G, Engelstad R, Chang J, Lovell E, Beckman W Journal of Vacuum Science & Technology B, 21(6), 2788, 2003 |
| 9 |
Effects of chrome pattern characteristics on image placement due to thermomechanical distortion of optical reticles during exposure Abdo A, Capodieci L, Lalovic I, Engelstad R Journal of Vacuum Science & Technology B, 21(6), 3052, 2003 |
| 10 |
Extreme ultraviolet mask fabrication with high inspection contrast TaSiNx absorber stack Wasson JR, Weisbrod EJ, Lu B, Mangat PJS, Dauksher WJ, Resnick DJ, Sohn J, Engelstad R, Pettibone D Journal of Vacuum Science & Technology B, 21(6), 3086, 2003 |