검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Kinetics and mechanisms for ion-assisted etching of InP thin films in HBr + Cl-2 + Ar inductively coupled plasma with various HBr/Cl-2 mixing ratios Kim C, Efremov A, Lee J, Han IK, Kim YH, Kwon KH Thin Solid Films, 660, 590, 2018 |
| 2 |
In situ mesa etching and immediate regrowth in a HVPE reactor for buried heterostructure device fabrication Messmer ER, Lindstrom T, Lourdudoss S Journal of Crystal Growth, 210(4), 600, 2000 |
| 3 |
Silicon Surfaces Treated by CF4, CF4/H-2, and CF4/O-2 RF Plasmas - Study by in-Situ Fourier-Transform Infrared Ellipsometry Shirafuji T, Stoffels WW, Moriguchi H, Tachibana K Journal of Vacuum Science & Technology A, 15(2), 209, 1997 |
| 4 |
Ion-Assisted Si/Xef2-Etching - Influence of Ion/Neutral Flux Ratio and Ion Energy Vugts MJ, Hermans LJ, Beijerinck HC Journal of Vacuum Science & Technology A, 14(4), 2138, 1996 |