| 1 |
Barrier-free process for fluorinated silicon glass film in Cu interconnects
Cheng YL, Lee CY, Huang WJ, Chen GS, Fang JS
Thin Solid Films, 678, 1, 2019 |
| 2 |
Effect of post-annealing treatment on silicon dioxide films for passivating flexible organic light-emitting diode
Chou DW, Chen KL, Huang CJ, Chen WR, Meen TH
Solid-State Electronics, 79, 130, 2013 |
| 3 |
Fluoroalkyl end-capped vinyltrimethoxysilane oligomer/anatase titanium oxide nanocomposites possessing photocatalytic activity even after calcination at 1000 degrees C
Guo SJ, Yoshioka H, Kakehi H, Kato Y, Miura M, Isu N, Ameduri B, Sawada H
Journal of Colloid and Interface Science, 387, 141, 2012 |
| 4 |
Properties of fluorinated silica glass deposited at low temperature by atmospheric plasma-enhanced chemical vapor deposition
Barankin MD, Williams TS, Gonzalez E, Hicks RF
Thin Solid Films, 519(4), 1307, 2010 |
| 5 |
On the contributions of the electronic polarizability and porosity to the reduction of the refractive index of SiOF films deposited by remote plasma-enhanced chemical vapor deposition
Alonso JC, Diaz-Bucio XM, Pichardo E, Rodriguez-Fernandez L, Ortiz A
Thin Solid Films, 474(1-2), 294, 2005 |
| 6 |
Surface modification of spin-on-glass film by liquid-phase deposition of fluorinated silicon oxide
Homma T, Kondo H, Inohara K, Nomoto M, Sakamoto M, Ariyama Y, Takahashi H
Thin Solid Films, 392(1), 107, 2001 |
| 7 |
Molecular dynamics simulations of Cl-2(+) impacts onto a chlorinated silicon surface: Energies and angles of the reflected Cl-2 and Cl fragments
Helmer BA, Graves DB
Journal of Vacuum Science & Technology A, 17(5), 2759, 1999 |
| 8 |
Reaction layer dynamics in ion-assisted Si/XeF2 etching: Ion flux dependence
Sebel PGM, Hermans LJF, Beijerinck HCW
Journal of Vacuum Science & Technology A, 17(6), 3368, 1999 |
| 9 |
Energetic ion bombardment of SiO2 surfaces : Molecular dynamics simulations
Abrams CF, Graves DB
Journal of Vacuum Science & Technology A, 16(5), 3006, 1998 |
| 10 |
Molecular dynamics simulations of Ar+ and Cl+ impacts onto silicon surfaces : Distributions of reflected energies and angles
Helmer BA, Graves DB
Journal of Vacuum Science & Technology A, 16(6), 3502, 1998 |
