| 1 |
Angular Dependence of Si3N4 Etching in C4F6/CH2F2/O-2/Ar Plasmas
Kim JH, Cho SW, Kim CK
Chemical Engineering & Technology, 40(12), 2251, 2017 |
| 2 |
Plasma deposition of fluorocarbon thin films using pulsed/continuous and downstream radio frequency plasmas
Liu DP, Gu JD, Feng ZQ, Li DM, Niu JH
Thin Solid Films, 517(9), 3011, 2009 |
| 3 |
Surface modification of materials by dielectric barrier discharge deposition of fluorocarbon films
Liu DP, Yin YJ, Li DM, Niu JH, Feng ZX
Thin Solid Films, 517(13), 3656, 2009 |
| 4 |
Molecular structure and hydrophobicity of polymeric fluorocarbon films deposited on PET substrates
Qi HJ, Wang D, Ma ZL, Sun SQ, Sui QY, Zhang WP, Lu JJ
Journal of Applied Polymer Science, 85(9), 1843, 2002 |
| 5 |
Plasma induced copolymerization of hexafluoropropylene and octafluoropropane
Leezenberg PB, Reiley TC, Tyndall GW
Journal of Vacuum Science & Technology A, 17(1), 275, 1999 |
| 6 |
Fluorinated amorphous carbon films for low permittivity interlevel dielectrics
Theil JA
Journal of Vacuum Science & Technology B, 17(6), 2397, 1999 |
| 7 |
Similarity of plasma-polymerized tetrafluoroethylene and fluoropolymer films deposited by rf sputtering of poly(tetrafluoroethylene)
Golub MA, Wydeven T, Johnson AL
Langmuir, 14(8), 2217, 1998 |
| 8 |
Plasma Polymerization of Trifluoromethyl-Substituted Perfluorocyclohexane Monomers
Hynes AM, Shenton MJ, Badyal JP
Macromolecules, 29(1), 18, 1996 |
| 9 |
Pulsed Plasma Polymerization of Perfluorocyclohexane
Hynes AM, Shenton MJ, Badyal JP
Macromolecules, 29(12), 4220, 1996 |
| 10 |
Plasma Polymerization of Sputtered Poly(Tetrafluoroethylene)
Ryan ME, Fonseca JL, Tasker S, Badyal JP
Journal of Physical Chemistry, 99(18), 7060, 1995 |
