검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Ion energy distributions and optical emission spectra in NF3-based process chamber cleaning plasmas Hsueh HP, McGrath RT, Ji B, Felker BS, Langan JG, Karwacki EJ Journal of Vacuum Science & Technology B, 19(4), 1346, 2001 |
| 2 |
Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry Pruette LC, Karecki SM, Reif R, Langan JG, Rogers SA, Ciotti RJ, Felker BS Journal of Vacuum Science & Technology A, 16(3), 1577, 1998 |
| 3 |
Electrical impedance analysis and etch rate maximization in NF3/Ar discharges Langan JG, Rynders SW, Felker BS, Beck SE Journal of Vacuum Science & Technology A, 16(4), 2108, 1998 |
| 4 |
Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas Sobolewski MA, Langan JG, Felker BS Journal of Vacuum Science & Technology B, 16(1), 173, 1998 |