| 1 |
Epitaxial Oxygen Getter for a Brownmillerite Phase Transformation in Manganite Films
Ferguson JD, Kim Y, Kourkoutis LF, Vodnick A, Woll AR, Muller DA, Brock JD
Advanced Materials, 23(10), 1226, 2011 |
| 2 |
Unimolecular rate constants for HX or DX elimination (X = F, Cl) from chemically activated CF3CH2CH2Cl, C2H5CH2Cl, and C2D5CH2Cl: Threshold energies for HF and HCl elimination
Ferguson JD, Johnson NL, Kekenes-Huskey PM, Everett WC, Heard GL, Setser DW, Holmes BE
Journal of Physical Chemistry A, 109(20), 4540, 2005 |
| 3 |
Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO2 and BaTiO3 particles
Ferguson JD, Weimer AW, George SM
Journal of Vacuum Science & Technology A, 23(1), 118, 2005 |
| 4 |
SnO2 atomic layer deposition on ZrO2 and Al nanoparticles: Pathway to enhanced thermite materials
Ferguson JD, Buechler KJ, Weimer AW, George SM
Powder Technology, 156(2-3), 154, 2005 |
| 5 |
TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O
Ferguson JD, Yoder AR, Weimer AW, George SM
Applied Surface Science, 226(4), 393, 2004 |
| 6 |
ALD of SiO2 at room temperature using TEOS and H2O with NH3 as the catalyst
Ferguson JD, Smith ER, Weimer AW, George SM
Journal of the Electrochemical Society, 151(8), G528, 2004 |
| 7 |
Surface chemistry and film growth during TiN atomic layer deposition using TDMAT and NH3
Elam JW, Schuisky M, Ferguson JD, George SM
Thin Solid Films, 436(2), 145, 2003 |
| 8 |
Atomic layer deposition of boron nitride using sequential exposures of BCl3 and NH3
Ferguson JD, Weimer AW, George SM
Thin Solid Films, 413(1-2), 16, 2002 |
| 9 |
Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions
Ferguson JD, Weimer AW, George SM
Applied Surface Science, 162, 280, 2000 |
| 10 |
Atomic layer deposition of ultrathin and conformal Al2O3 films on BN particles
Ferguson JD, Weimer AW, George SM
Thin Solid Films, 371(1-2), 95, 2000 |
