화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Effects of annealing on X-ray-amorphous CVD W-Si-N barrier layer materials
Gokce OH, Amin S, Ravindra NM, Szostak DJ, Paff RJ, Fleming JG, Galewski CJ, Shallenberger J, Eby R
Thin Solid Films, 353(1-2), 149, 1999
2 Growth and properties of W-Si-N diffusion barriers deposited by chemical vapor deposition
Fleming JG, Roherty-Osmun E, Smith PM, Custer JS, Kim YD, Kacsich T, Nicolet MA, Galewski CJ
Thin Solid Films, 320(1), 10, 1998
3 Fabrication and Testing of Vertical Metal Edge Emitters with Well-Defined Gate to Emitter Separation
Fleming JG, Ohlberg DA, Felter T, Malinowski M
Journal of Vacuum Science & Technology B, 14(3), 1958, 1996
4 In-Situ Monitoring of the Products from the Sih4+wf6 Tungsten Chemical-Vapor-Deposition Process by Microvolume Moss Spectrometry
Cheek RW, Kelber JA, Fleming JG, Blewer RS, Lujan RD
Journal of the Electrochemical Society, 140(12), 3588, 1993