화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Properties of fluorinated silica glass deposited at low temperature by atmospheric plasma-enhanced chemical vapor deposition
Barankin MD, Williams TS, Gonzalez E, Hicks RF
Thin Solid Films, 519(4), 1307, 2010
2 On the contributions of the electronic polarizability and porosity to the reduction of the refractive index of SiOF films deposited by remote plasma-enhanced chemical vapor deposition
Alonso JC, Diaz-Bucio XM, Pichardo E, Rodriguez-Fernandez L, Ortiz A
Thin Solid Films, 474(1-2), 294, 2005
3 Surface modification of spin-on-glass film by liquid-phase deposition of fluorinated silicon oxide
Homma T, Kondo H, Inohara K, Nomoto M, Sakamoto M, Ariyama Y, Takahashi H
Thin Solid Films, 392(1), 107, 2001