화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Performance and analysis of an electron cyclotron resonance plasma cathode
Hidaka Y, Foster JE, Getty WD, Gilgenbach RM, Lau YY
Journal of Vacuum Science & Technology A, 25(4), 781, 2007
2 Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition (vol A16, pg 2198, 1998)
Foster JE, Wendt AE, Wang WW, Booske JH
Journal of Vacuum Science & Technology A, 17(1), 322, 1999
3 Measurement of electron energy distribution function in an argon copper plasma for ionized physical vapor deposition
Lu ZC, Foster JE, Snodgrass TG, Booske JH, Wendt AE
Journal of Vacuum Science & Technology A, 17(3), 840, 1999
4 Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition
Foster JE, Wendt AE, Wang WW, Booske JH
Journal of Vacuum Science & Technology A, 16(4), 2198, 1998
5 Antenna sputtering in an internal inductively coupled plasma for ionized physical vapor deposition
Foster JE, Wang W, Wendt AE, Booske J
Journal of Vacuum Science & Technology B, 16(2), 532, 1998