화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Effect of microstructure on deprotection kinetics in photoresist
Fryer DS, Singh V, Bollepalli SB, Granovsky AA
Journal of Vacuum Science & Technology B, 26(6), 2311, 2008
2 Extraordinary elevation of the glass transition temperature of thin polymer films grafted to silicon oxide substrates
Tate RS, Fryer DS, Pasqualini S, Montague MF, de Pablo JJ, Nealey PF
Journal of Chemical Physics, 115(21), 9982, 2001
3 Dependence of the glass transition temperature of polymer films on interfacial energy and thickness
Fryer DS, Peters RD, Kim EJ, Tomaszewski JE, de Pablo JJ, Nealey PF, White CC, Wu WL
Macromolecules, 34(16), 5627, 2001
4 Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system
Somervell MH, Fryer DS, Osborn B, Patterson K, Byers J, Willson CG
Journal of Vacuum Science & Technology B, 18(5), 2551, 2000
5 Scaling of T-g and reaction rate with film thickness in photoresist: A thermal probe study
Fryer DS, Nealey PF, de Pablo JJ
Journal of Vacuum Science & Technology B, 18(6), 3376, 2000
6 Thermal probe measurements of the glass transition temperature for ultrathin polymer films as a function of thickness
Fryer DS, Nealey PF, de Pablo JJ
Macromolecules, 33(17), 6439, 2000
7 Study of acid diffusion in resist near the glass transition temperature
Fryer DS, Bollepali S, de Pablo JJ, Nealey PF
Journal of Vacuum Science & Technology B, 17(6), 3351, 1999