화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Plasma-enhanced metal organic chemical vapor deposition of high purity copper thin films using plasma reactor with the H atom source
Jin HJ, Shiratani M, Kawasaki T, Fukuzawa T, Kinoshita T, Watanabe Y, Kawasaki H, Toyofuku M
Journal of Vacuum Science & Technology A, 17(3), 726, 1999
2 Growth-Processes of Particles in High-Frequency Silane Plasmas
Watanabe Y, Shiratani M, Kawasaki H, Singh S, Fukuzawa T, Ueda Y, Ohkura H
Journal of Vacuum Science & Technology A, 14(2), 540, 1996
3 In-Situ Polarization-Sensitive Laser-Light-Scattering Method for Simultaneous Measurements of 2-Dimensional Spatial Size and Density Distributions of Particles in Plasmas
Shiratani M, Kawasaki H, Fukuzawa T, Watanabe Y
Journal of Vacuum Science & Technology A, 14(2), 603, 1996
4 Contribution of Short Lifetime Radicals to the Growth of Particles in SiH4 High-Frequency Discharges and the Effects of Particles on Deposited Films
Watanabe Y, Shiratani M, Fukuzawa T, Kawasaki H, Ueda Y, Singh S, Ohkura H
Journal of Vacuum Science & Technology A, 14(3), 995, 1996