검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Oxygen plasma functionalization of poly (p-phenilene sulphide) Cvelbar U, Mozetic M, Junkar I, Vesel A, Kovac J, Drenik A, Vrlinic T, Hauptman N, Klanjsek-Gunde M, Markoli B, Krstujovic N, Milosevic S, Gaboriau F, Belmonte T Applied Surface Science, 253(21), 8669, 2007 |
| 2 |
Density of O-atoms in an afterglow reactor during treatment of wool Canal C, Gaboriau F, Ricard A, Mozetic M, Cvelbar U, Drenik A Plasma Chemistry and Plasma Processing, 27(4), 404, 2007 |
| 3 |
Etching mechanisms of Si and SiO2 in inductively coupled fluorocarbon plasmas: Correlation between plasma species and surface etching Gaboriau F, Fernandez-Peignon MC, Cartry G, Cardinaud C Journal of Vacuum Science & Technology A, 23(2), 226, 2005 |
| 4 |
Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO2 Gaboriau F, Peignon MC, Cartry G, Rolland L, Eon D, Cardinaud C, Turban G Journal of Vacuum Science & Technology A, 20(3), 919, 2002 |
| 5 |
Selective and deep plasma etching of SiO2: Comparison between different fluorocarbon gases (CF4, C2F6, CHF3) mixed with CH4 or H-2 and influence of the residence time Gaboriau F, Cartry G, Peignon MC, Cardinaud C Journal of Vacuum Science & Technology B, 20(4), 1514, 2002 |
| 6 |
New polymer materials for nanoimprinting Schulz H, Scheer HC, Hoffmann T, Torres CMS, Pfeiffer K, Bleidiessel G, Grutzner G, Cardinaud C, Gaboriau F, Peignon MC, Ahopelto J, Heidari B Journal of Vacuum Science & Technology B, 18(4), 1861, 2000 |
| 7 |
A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor Aumaille K, Vallee C, Granier A, Goullet A, Gaboriau F, Turban G Thin Solid Films, 359(2), 188, 2000 |