검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Enhancement of semiconductor wafer cleaning by chelating agent addition Gale GW, Rath DL, Cooper EI, Estes S, Okorn-Schmidt HF, Brigante J, Jagannathan R, Settembre G, Adams E Journal of the Electrochemical Society, 148(9), G513, 2001 |
| 2 |
Dissolution kinetics for atomic, molecular, and ionic contamination from silicon wafers during aqueous processing Suni II, Gale GW, Busnaina AA Journal of the Electrochemical Society, 146(9), 3522, 1999 |
| 3 |
A visualization technique for surface flows Gale GW, Busnaina AA, Zaazhoa MR Chemical Engineering Communications, 165, 167, 1998 |
| 4 |
Removal of silica particles from silicon substrates using megasonic cleaning Busnaina AA, Gale GW Particulate Science and Technology, 15(3), 361, 1997 |
| 5 |
An Experimental-Study of Megasonic Cleaning of Silicon-Wafers Busnaina AA, Kashkoush II, Gale GW Journal of the Electrochemical Society, 142(8), 2812, 1995 |
| 6 |
Removal of particulate contaminants using ultrasonics and megasonics: A review Gale GW, Busnaina AA Particulate Science and Technology, 13(3), 197, 1995 |